ガラス基板: 高度な半導体パッケージにおける破壊的な革命

The Quiet Material Revolution Reshaping Electronics

Intel’s 2024 global debut of glass substrate packaging technology detonated a seismic shift in semiconductor manufacturing. At the 2025 Suzhou TGV Industry Summit, technical leaders from Intel, TSMC, and Samsung concurred: “Glass substrates will drive semiconductor packaging into a ‘transparent era,’ with market penetration exceeding 50% within five years.” This analysis explores the technological rationale, industrial chain transformation, and implications for プリント基板 industries.

1. Technical Superiority: Why Glass Substrates Redefine Packaging

1.1 Physical Property Dominance

Comparative analysis reveals glass substrates’ overwhelming advantages :

(Source: Intel Technical White Paper, Corning Materials Lab)

Signal Loss Equation Analysis
Attenuation (α) is defined as:

With ε’≈3.9 and ε”≈0.001 for glass substrates, 高周波 (100GHz) losses reduce by 67% versus organic substrates (ε’≈4.5, ε”≈0.03).

1.2 Exponential Density Enhancement

NVIDIA’s GB200 GPU demonstrates 50%+ die count increase using glass substrates, achieving 5μm/5μm wiring density through:

• Atomic-level flatness (<0.01μm roughness)

• Tunable CTE matching (3ppm/°C)

• Mechanical stability (700×700mm panel warpage <50μm)

2. Process Innovations: Industrializing TGV Technology

2.1 Through-Glass-Via Manufacturing Breakthroughs

Titanrise Tech’s laser modification achieves 8,000 vias/sec at ±5μm precision (3a), 160× faster than conventional methods. Key steps:

1. Picosecond Laser Modification: Creates micron-scale altered zones

2. HF Etching: Achieves 100:1 aspect ratio

3. Metallization: PVD sputtering + 電気めっき (>15MPa adhesion)

2.2 Metallization Advancements

Four technical routes address glass adhesion:

1. Electroless Cu + マイクロエッチング (AKM Solutions)

2. Nano-Ag Paste + LT Sintering (Wintech Patent)

3. Plasma Grafting (IME-CAS Technology)

4. PVD Ti/Cu Stack (Titanrise Standard)

その中で, UGPCB has invested heavily in introducing the DEP600 equipment, which adopts high aspect ratio sputtering technology, achieving 95% coverage in 10:1 hole profiles, with a metal resistivity of less than 2.5 μΩ·cm, reaching an internationally leading level.

3. Industry Landscape: Global Competition Intensifies

3.1 Market Growth Projections

Prismark forecasts explosive expansion:

• 2025: $916m (TGV substrates)

• 2030: $4.2B (full applications)

• 2035: $11.3B (entire ecosystem)

3.2 Geopolitical Tech Race

• アメリカ合衆国: Intel standards + Corning supply dominance

• Korea: Samsung’s “Glass Alliance” + SKC’s 9-layer stacks

• 中国: Wintech/AKM mass production + JFE 2026 localization

4. Challenges & ソリューション: Commercialization Hurdles

4.1 Cost Reduction Pathways

Current 3-5× cost premium vs traditional substrates will plummet through:

• 85% large-panel (>2m²) utilization

• 90% laser drilling cost reduction

• Metallization yield improvement (60%→92%)

4.2 Reliability Certification

New standards required:

• Thermal Cycling (-55°C–250°C, 1,000 サイクル)

• EM Lifetime (MTTF >10⁷ hours @ JEP154)

• High-Frequency Stability (<0.5dB/cm @100GHz)

5. PCB Industry Implications: Threat vs Opportunity

5.1 Market Disruption

• 30% HDI/基板 replacement risk

• Hybrid (glass+resin) substrate opportunities

5.2 Technology Synergies

• Picosecond laser drilling adoption

• PVD-enhanced HDI trace precision

• Optical inspection <0.1μm resolution

結論: Transparent Substrates, Opaque Futures

China now leads critical TGV sectors (装置, testing, 材料). As Intel’s Pat Gelsinger notes: “Material innovation becomes the new Moore’s Law at atomic scales.” This glass-driven revolution may unlock semiconductor’s second growth curve.