UGPCB 로고
The Quiet Material Revolution Reshaping Electronics
Intel’s 2024 global debut of glass substrate packaging technology detonated a seismic shift in semiconductor manufacturing. At the 2025 Suzhou TGV Industry Summit, technical leaders from Intel, TSMC, and Samsung concurred: “Glass substrates will drive semiconductor packaging into a ‘transparent era,’ with market penetration exceeding 50% within five years.” This analysis explores the technological rationale, industrial chain transformation, and implications for PCB industries.
1. Technical Superiority: Why Glass Substrates Redefine Packaging
1.1 Physical Property Dominance
Comparative analysis reveals glass substrates’ overwhelming advantages :
| 매개 변수 | Organic Substrates | Silicon Interposers | 유리 기판 |
|---|---|---|---|
| 유전 상수 | 4.2-4.8 | 11.9 | 3.9 |
| 손실 탄젠트 | 0.02-0.04 | 0.001-0.01 | 0.0001-0.001 |
| CTE (ppm/°C) | 16-18 | 2.6 | 3.2-7.5 (tunable) |
| 열전도율 | 0.2-0.3 | 150 | 1.1 |
| Surface Roughness | 0.5-1.0 μm | 0.05 μm | <0.01 μm |
(Source: Intel Technical White Paper, Corning Materials Lab)
Signal Loss Equation Analysis
Attenuation (α) is defined as:
With ε’≈3.9 and ε”≈0.001 for glass substrates, 고주파 (100GHz) losses reduce by 67% versus organic substrates (ε’≈4.5, ε”≈0.03).
1.2 Exponential Density Enhancement
NVIDIA’s GB200 GPU demonstrates 50%+ die count increase using glass substrates, achieving 5μm/5μm wiring density through:
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Atomic-level flatness (<0.01μm roughness)
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Tunable CTE matching (3ppm/°C)
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Mechanical stability (700×700mm panel warpage <50μm)
2. Process Innovations: Industrializing TGV Technology
2.1 Through-Glass-Via Manufacturing Breakthroughs
Titanrise Tech’s laser modification achieves 8,000 vias/sec at ±5μm precision (3에이), 160× faster than conventional methods. Key steps:
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Picosecond Laser Modification: Creates micron-scale altered zones
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HF Etching: Achieves 100:1 aspect ratio
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Metallization: PVD sputtering + 전기 도금 (>15MPa adhesion)
2.2 Metallization Advancements
Four technical routes address glass adhesion:
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Electroless Cu + 마이크로 에칭 (AKM Solutions)
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Nano-Ag Paste + LT Sintering (Wintech Patent)
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Plasma Grafting (IME-CAS Technology)
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PVD Ti/Cu Stack (Titanrise Standard)
그 중, UGPCB has invested heavily in introducing the DEP600 equipment, which adopts high aspect ratio sputtering technology, achieving 95% coverage in 10:1 hole profiles, with a metal resistivity of less than 2.5 μΩ·cm, reaching an internationally leading level.
3. Industry Landscape: Global Competition Intensifies
3.1 Market Growth Projections
Prismark forecasts explosive expansion:
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2025: $916중 (TGV substrates)
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2030: $4.2비 (full applications)
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2035: $11.3비 (entire ecosystem)
3.2 Geopolitical Tech Race
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USA: Intel standards + Corning supply dominance
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Korea: Samsung’s “Glass Alliance” + SKC’s 9-layer stacks
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중국: Wintech/AKM mass production + JFE 2026 localization
4. Challenges & Solutions: Commercialization Hurdles
4.1 Cost Reduction Pathways
Current 3-5× cost premium vs traditional substrates will plummet through:
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85% large-panel (>2m²) utilization
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90% laser drilling cost reduction
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Metallization yield improvement (60%→92%)
4.2 Reliability Certification
New standards required:
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Thermal Cycling (-55°C–250°C, 1,000 사이클)
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EM Lifetime (MTTF >10⁷ hours @ JEP154)
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High-Frequency Stability (<0.5dB/cm @100GHz)
5. PCB Industry Implications: Threat vs Opportunity
5.1 Market Disruption
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30% HDI/기판 replacement risk
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Hybrid (glass+resin) substrate opportunities
5.2 Technology Synergies
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Picosecond laser drilling adoption
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PVD-enhanced HDI trace precision
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Optical inspection <0.1μm resolution
결론: Transparent Substrates, Opaque Futures
China now leads critical TGV sectors (장비, 테스트, 재료). As Intel’s Pat Gelsinger notes: “Material innovation becomes the new Moore’s Law at atomic scales.” This glass-driven revolution may unlock semiconductor’s second growth curve.
